This video introduces a nano imaging lab at the Helmholtz Institute Jena and the Faculty of Physics and Astronomy at the University of Jena. The lab focuses on generating extreme ultraviolet (EUV) light via high harmonic generation in a compact, laser-driven setup for nanoscale imaging. The system, developed over the past decade, allows for non-destructive investigation of buried nanoscale structures with element-specific contrast and nanometer resolution, enabling the detection of subtle features like interface roughness or graphene layers. An online monitoring system provides sensitivity comparable to synchrotron facilities. The goal is to make advanced EUV diagnostics accessible for real-world applications in material science, nano electronics, and ultra-fast physics.
Inside Jena's Laser: Nano Imaging Lab Summary
0:21 Nano Imaging Lab Introduction: The video introduces a lab dedicated to nano imaging using extreme ultraviolet (EUV) light.
0:29 EUV Generation: The lab produces EUV light via high harmonic generation in a compact, laser-driven setup.
0:38 System Development & Capabilities: The system has been developed over 10 years to perform a broad range of EUV imaging and spectroscopy experiments.
0:52 Nanoscale Structure Investigation: The setup can investigate buried nanoscale structures non-destructively.
0:55 Element-Specific Contrast & Resolution: It offers element-specific contrast and nanometer resolution.
0:59 Subtle Feature Detection: This allows for precise determination of position and detection of subtle features like interface roughness or graphene mono layers.
1:09 Online Monitoring: An included online monitoring system achieves sensitivities close to synchrotron facilities.
1:27 Real-World Applications: The goal is to make advanced EUV diagnostics accessible for applications in material science, nano electronics, and ultra-fast physics.
1:35 Call to Action: Viewers interested in the work are encouraged to reach out.